Applied Materials Israel Limited

Orbot Instruments Ltd.

Applied Materials, Inc.

Kla Tencor Corporation

Applied Materials Isreal Ltd

Meir Aloni

Gilad Almogy

Yair Eran

Ehud Tirosh

Doron Meshulach

Mula Friedman

Vladimir Levinski

Daniel Kandel

Yoel Feler

Noam Sapiens

Yigal Katzir

Alon Litman

Amir Alon

Barak Bringoltz

Alexander Svizher

Itzhak Katz

Yonatan Lehman

Jimmy Vishnipolsky

Guy Ben Dov

Hadar Shalmoni

Gideon Rosenfeld

Haim Feldman

Paykin Irina

Haim Kaplan

Joel Yolles

Amnon Manassen

Daria Negri

Ohad Bachar

Boris Golovanevsky

Nissim Elmaliach

Irina Paykin

Yonatah Lehman

Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.

Symmetric target design in scatterometry overlay metrology

Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.

Phase characterization of targets

The invention provides a method and printer for printing an image that comprises at least one group of highly dense shapes, the method including: (i) determining multiple intermediate schemes such as to allow printing corresponding intermediate images on an object; wherein at least one intermediate scheme comprises directing at least one interference pattern toward at least one location corresponding to at least one group of highly dense shapes; (ii) generating an array of light entities in response to an intermediate scheme; (iii) directing the array of light entities towards the object to form the intermediate image; and (iv) moving the object relative to the light entities while repeating the steps of generating and directing to expose the object with the image. The invention provides a system that includes: (i) means for determining multiple intermediate schemes such as to allow printing corresponding intermediate images on an object; wherein at least one intermediate scheme comprises directing at least one interference pattern towards at least one location corresponding to at least one group of highly dense shapes; (ii) a programmable optical radiation source for generating an array of light entities in response to an intermediate scheme; (iii) optics for directing the array of light entities towards the object to form the intermediate image; and (iv) a translator for moving the object relative to the light entities while repeating the steps of generating and directing to expose the object with the image.

High resolution printer and a method for high resolution printing

A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.

Raster frame beam system for electron beam lithography

A printer and method for recording a predefined multiple intensity level image on a substrate, the method includes the steps of: converting the predetermined image to multiple intensity level associated images; converting a light beam to multiple light beam arrays; modulating each light beam array to provide modulated light beam arrays, in response to a corresponding intensity level associated image to be recorded on the substrate; directing each modulated light beam array to impinge on the substrate; and repeating the steps of converting, modulating and directing while moving the substrate until the predefined image is imaged on the substrate. The printer includes a programmable optical radiation source for providing multiple modulated light beam arrays and for directing the modulated light beam arrays to impinge on the substrate, each modulated light beam array being modulated in response to an input signal corresponding to a corresponding intensity level associated image to be recorded on the substrate; whereas a superposition of the intensity level associated images forms the predefined image on the substrate, and a movable stage for moving the substrate until the predefined image is imaged on the substrate.

Printer and a method for recording a multi-level image

Data converter apparatus for converting in real time data stored in an input compact format into an output expanded real time format. The data including a plurality of groups and repetition of the groups. The groups including, each, many basic geometric figures (BGF). The data converter includes a processor adapted to selecting data relating to a predetermined division, dividing and processing the data into consecutive bins according to scan order, which bins have structural correspondence to the input format. The data converter is further capable of sub-dividing the division into sub-divisions which have structural correspondence to the output format. The data processor is further capable of processing and allocating the BGFs in the bins to sub-divisions to thereby produce a division data stream in the output expanded real time format.

Data converter apparatus and method particularly useful for a database-to-object inspection system

A defect detection system for inspecting objects such as reticles, photomasks, semiconductor wafers, flat panel displays and other patterned objects has two or more stages, whereby the object is examined separately for fine defects, by inspecting a binary level representation of the object, and for ultra fine defects, by inspecting a gray level representation of the object. The system also includes re-inspection apparatus for re-inspection of detected defects, thereby to reduce the false alarm rate, and for classifying the remaining defects by size, area and type.

Apparatus and method for microscopic inspection of articles

A method for comparing first and second digital representations of an image, the method comprising the steps of: for each individual translation from among a plurality of translations from the first digital representation to the second digital representation: for each individual image location from among a plurality of image locations within a comparison entity within the first digital representation, determining a binary legitimacy value of the individual translation for the individual image location by comparing the individual image location to a location in the second digital representation defined by operating the individual translation on the individual image location; and combining the binary legitimacy values of image locations within the comparison entity, thereby to generate a comparison entity legitimacy value determining whether the individual translation is legitimate for the comparison entity; and announcing a defect for the comparison entity if none of the plurality of translations are legitimate therefor.

Apparatus and method for comparing and aligning two digital

An inspection method including the steps of providing a patterned object to be inspected and compared with a reference, inspecting the patterned object and providing an output of information relating to the visual characteristics of the patterned object, comparing binary level information relating to the visual characteristics of the patterned object to binary level information relating to the visual characteristics of the reference, and comparing gray level information relating to the visual characteristics of the patterned object to gray level information relating to the visual characteristics of the reference.

Apparatus and method for inspection of a patterned object by comparison

The present invention seeks to provide an improved system for inspection of and detection of defects in objects such as reticles, photomasks, semiconductor wafers, flat panel displays and other patterned objects. Preferably, the system has two or more stages, whereby the object is examined separately for fine defects, preferably by inspecting a binary level representation of the object, and for ultra fine defects, preferably by inspecting a gray level representation of the object. The system also preferably includes reinspection apparatus for reinspection of detected defects, thereby to reduce the false alarm rate, and for classifying the remaining defects by size, area and type.

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Hertslia, Israel

Meir Aloni