The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Sep. 11, 2003
Meir Aloni, Hertslia, IL;
Mula Friedman, Nes Ziona, IL;
Jimmy Vishnipolsky, Petah Tikva, IL;
Gilad Almogy, Rehovot, IL;
Alon Litman, Nes Ziona, IL;
Yonatah Lehman, Bet Gamliel, IL;
Doron Meshulach, Ramat Gan, IL;
Ehud Tirosh, Nes Ziona, IL;
Meir Aloni, Hertslia, IL;
Mula Friedman, Nes Ziona, IL;
Jimmy Vishnipolsky, Petah Tikva, IL;
Gilad Almogy, Rehovot, IL;
Alon Litman, Nes Ziona, IL;
Yonatah Lehman, Bet Gamliel, IL;
Doron Meshulach, Ramat Gan, IL;
Ehud Tirosh, Nes Ziona, IL;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.