This inventor holds 5 USPTO granted patents. Top assignees: Applied Materials, Inc., Applied Materials Israel Limited. Active years: 2002-2010.
Location History:
- Aharon, IL (2002)
- Nes Ziona, IL (2006 - 2010)
Company Filing History:
3 out of 14,403 
2 out of 562 
Years Active: 2002-2010
Title: Mula Friedman: Innovator in Electron Beam Lithography
Introduction
Mula Friedman is a notable inventor based in Nes Ziona, Israel. She has made significant contributions to the field of electron beam lithography, holding a total of 5 patents. Her innovative work has advanced the technology used in various applications, particularly in the semiconductor industry.
Latest Patents
One of Mula Friedman's latest patents is a raster frame beam system for electron beam lithography. This method involves writing a master image on a substrate by dividing the image into a matrix of frames. Each frame contains an array of pixels that define a respective frame image. An electron beam is then scanned in a raster pattern over the substrate, shaping the beam responsively to the respective frame image. This allows the electron beam to simultaneously write multiple pixels onto the substrate in each frame.
Career Highlights
Throughout her career, Mula Friedman has worked with prominent companies in the technology sector. She has been associated with Applied Materials, Inc. and Applied Materials Israel Limited. Her experience in these organizations has contributed to her expertise in electron beam lithography and related technologies.
Collaborations
Mula has collaborated with several professionals in her field, including Meir Aloni and Jimmy Vishnipolsky. These collaborations have further enriched her work and have led to advancements in her innovative projects.
Conclusion
Mula Friedman is a distinguished inventor whose work in electron beam lithography has made a significant impact on the industry. Her patents and collaborations reflect her dedication to innovation and technology advancement.