The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Jun. 07, 2001
Shirley Hemar, Tel Aviv, IL;
Alex Goldenshtein, Rishon Lexlon, IL;
Gadi Greenberg, Tel-Aviv, IL;
Mula Friedman, Nes Ziona, IL;
Boaz Kenan, Rehovot, IL;
Shirley Hemar, Tel Aviv, IL;
Alex Goldenshtein, Rishon Lexlon, IL;
Gadi Greenberg, Tel-Aviv, IL;
Mula Friedman, Nes Ziona, IL;
Boaz Kenan, Rehovot, IL;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A reticle inspection system and method for complete and fast inspection of phase shift mask reticles, both for incoming inspection and for periodic and pre-exposure inspection tool, is employable by facilities such as mask shops as an inspection tool compatible to the mask shop's customers. The inventive system and method detect phase errors in an aerial image by acquiring the image of the phase shift mask under the same optical conditions as the exposure conditions (i.e. wavelength, numerical aperture, sigma, and illumination aperture type). Images are acquired at a positive out-of-focus and a negative out-of-focus, and are compared in order to enhance possible phase error. The term 'phase error' refers to the acceptable range of the phase deviation from the programmed 180° on the phase shift mask, by using the exposure system to achieve the image on the photoresist, satisfying the requirements of the wafer specification.