Gadi Greenberg

Title: Gadi Greenberg: Innovator in Lithographic Mask Technology

Introduction

Gadi Greenberg is a prominent inventor based in Tel Aviv, Israel, known for his significant contributions to the field of lithographic mask technology. With a total of 13 patents to his name, Greenberg has made remarkable advancements that enhance defect detection techniques in semiconductor manufacturing.

Latest Patents

One of Greenberg's latest patents is focused on a system and methods of generating comparable regions of a lithographic mask. This innovation provides methods for generating an in-die reference for die-to-die defect detection techniques. The inspection methods utilize in-die references by identifying similar blocks of a lithographic mask, which are defined by comparable CAD information. A comparison distance is selected based on the areas of the similar blocks and their spatial relationships. The similar blocks are then aggregated to define multiple aggregated areas, leading to the identification of comparable regions of the lithographic mask. Images of these comparable regions are captured using an inspection module, and the acquired images are subsequently compared. Another notable patent is for a closed-loop automatic defect inspection and classification system. This inspection apparatus includes an imaging module that captures images of defects at various locations on a sample. A processor processes these images to automatically classify the defects and controls the imaging module to continue capturing images based on the assigned classifications.

Career Highlights

Throughout his career, Gadi Greenberg has worked with leading companies in the semiconductor industry, including Applied Materials Israel Limited and Applied Materials, Inc. His work has significantly impacted the efficiency and accuracy of defect detection in lithographic processes.

Collaborations

Greenberg has collaborated with notable professionals in his field, including Idan Kaizerman and Nimrod Sarig. These collaborations have further enriched his innovative contributions to technology.

Conclusion

Gadi Greenberg stands out as a key figure in the advancement of lithographic mask technology, with a strong portfolio of patents that reflect his expertise and innovative spirit. His work continues to influence the semiconductor industry and improve defect detection methodologies.