The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 17, 2012

Filed:

Jan. 08, 2008
Applicants:

Ishai Schwarzband, Or-Yehuda, IL;

Shmoolik Mangan, Rehovot, IL;

Chaim Braude, Nes-Ziona, IL;

Michael Ben-yishai, Natanya, IL;

Gadi Greenberg, Tel Aviv, IL;

Inventors:

Ishai Schwarzband, Or-Yehuda, IL;

Shmoolik Mangan, Rehovot, IL;

Chaim Braude, Nes-Ziona, IL;

Michael Ben-Yishai, Natanya, IL;

Gadi Greenberg, Tel Aviv, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.


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