Company Filing History:
Years Active: 2011-2016
Title: Michael Ben-Yishai: Innovator in Mask Inspection Technology
Introduction
Michael Ben-Yishai is a notable inventor based in Natanya, Israel. He has made significant contributions to the field of mask inspection technology, holding a total of 3 patents. His work focuses on enhancing the lithography process, which is crucial in semiconductor manufacturing.
Latest Patents
Among his latest patents is a system for the detection of weak points in a mask. This innovative inspection system includes a computer program product that stores instructions for obtaining an aerial image of an area of the mask. The aerial image represents an expected image to be formed on a photoresist during a lithography process. This process involves illuminating the area of the mask with a lithography tool, where the photoresist has a printability threshold. The system searches for weak points in the mask, identifying local extremum points or crossing points of the printability threshold.
Another significant patent is a method and system for evaluating an evaluated pattern of a mask. This method includes receiving multiple moments that represent an image of the evaluated pattern. The size of information required for these moments is substantially smaller than the pixel information that forms the image. The processing of these moments allows for the determination of at least one shape parameter of the evaluated pattern.
Career Highlights
Michael Ben-Yishai is currently employed at Applied Materials Israel Limited, where he continues to develop innovative solutions in the field of semiconductor manufacturing. His expertise in mask inspection technology has positioned him as a key player in the industry.
Collaborations
He has collaborated with notable coworkers, including Ishai Schwarzband and Shmoolik Mangan, contributing to various projects that enhance the capabilities of mask inspection systems.
Conclusion
Michael Ben-Yishai's contributions to mask inspection technology through his patents and work at Applied Materials Israel Limited highlight his role as an influential inventor in the semiconductor industry. His innovative approaches continue to shape the future of lithography processes.