The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Feb. 01, 2007
Michael Ben Yishai, Natanya, IL;
Mark Wagner, Rehovot, IL;
Avishai Bartov, Hod Hasharon, IL;
Gadi Greenberg, Tel Aviv, IL;
Lior Shoval, Rehovot, IL;
Ophir Gvirtzer, Rehovot, IL;
Michael Ben Yishai, Natanya, IL;
Mark Wagner, Rehovot, IL;
Avishai Bartov, Hod Hasharon, IL;
Gadi Greenberg, Tel Aviv, IL;
Lior Shoval, Rehovot, IL;
Ophir Gvirtzer, Rehovot, IL;
Applied Materials Israel, Ltd., Rehovot, IL;
Abstract
A method and system are presented for evaluating a variation of a parameter of a pattern. The method includes processing data indicative of an aerial intensity image of at least a portion of a patterned article, and determining values of a certain functional of the aerial image intensity for predetermined regions within the at least portion of the patterned article. The values of the aerial image intensity functional are indicative of a variation of at least one parameter of the pattern within the at least portion of the patterned article or are indicative of a variation of at least one parameter of a pattern manufactured by utilizing the patterned article.