Location History:
- Bnei Darom, IL (2011)
- Rehovot, IL (2012)
Company Filing History:
Years Active: 2011-2012
Title: The Innovative Contributions of Lior Shoval
Introduction
Lior Shoval, an accomplished inventor based in Rehovot, Israel, has made significant strides in the field of pattern evaluation through his innovative methodologies. With two patents to his name, Shoval’s advancements are poised to enhance precision in lithographic processes, which are crucial in various manufacturing industries.
Latest Patents
Shoval's recent patents include two cutting-edge methods that address the evaluation of variations in patterned articles.
1. **Method and System for Evaluating a Variation in a Parameter of a Pattern** - This patent presents a framework for assessing variations of parameters within a patterned article. The method processes data from aerial intensity images and determines functional values based on these images, which helps in identifying variations of parameters in both the pattern and the manufactured objects using it.
2. **Method and System for Evaluating an Object that has a Repetitive Pattern** - This innovative method focuses on detecting placement errors in lithographic masks. By measuring distances between pairs of points on the mask and comparing them to a reference result, the method highlights relative placement errors, providing crucial feedback for ensuring accuracy in lithographic applications.
Career Highlights
Lior Shoval is currently employed at Applied Materials Israel Limited, a renowned company specializing in materials engineering and equipment for semiconductor manufacturing. His work at this prominent organization allows him to influence advancements in technology critical for the semiconductor industry.
Collaborations
Throughout his career, Shoval has collaborated with notable colleagues, including Michael Ben Yishai and Mark Wagner. These partnerships foster a dynamic exchange of ideas and innovation, contributing to the successful development of his patents.
Conclusion
Lior Shoval stands as a prominent figure in innovation, with his work at Applied Materials Israel Limited reflecting a commitment to enhancing the precision of manufacturing technologies. His contributions, marked by his latest patents, showcase not only his technical expertise but also his potential to revolutionize the field of lithographic pattern evaluation.