This inventor holds 3 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2006-2009.
Company Filing History:
Years Active: 2006-2009
Title: The Innovations of Shirley Hemar
Introduction
Shirley Hemar is a notable inventor based in Tel Aviv, Israel. She has made significant contributions to the field of technology, particularly in the area of reticle inspection. With a total of 3 patents to her name, her work has had a profound impact on manufacturing processes.
Latest Patents
One of her latest patents is a method and apparatus for inspecting a reticle that measures line widths using an inspection tool. This tool images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference, or 'bias' information, is then processed off-line to create a map of all the local line-width deviation values of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process. It serves as a 'go/no go' criteria for the validity of the reticle and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.
Career Highlights
Shirley Hemar is currently employed at Applied Materials, Inc., where she continues to innovate and develop new technologies. Her work has been instrumental in enhancing the efficiency and accuracy of reticle manufacturing.
Collaborations
Some of her notable coworkers include Ami Sade and Yair Eran, with whom she collaborates on various projects.
Conclusion
Shirley Hemar's contributions to the field of technology through her patents and work at Applied Materials, Inc. highlight her role as a leading inventor. Her innovations continue to influence the manufacturing industry positively.