The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2006
Filed:
Dec. 19, 2002
Yair Eran, Rehovot, IL;
Gad Greenberg, Tel Aviv, IL;
Ami Sade, Nahariya, IL;
Shirley Hemar, Tel Aviv, IL;
Yair Eran, Rehovot, IL;
Gad Greenberg, Tel Aviv, IL;
Ami Sade, Nahariya, IL;
Shirley Hemar, Tel Aviv, IL;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or 'bias') information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a 'go/no go' criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.