This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Innovations by Yonatah Lehman
Introduction
Yonatah Lehman is an accomplished inventor based in Bet Gamliel, Israel. He has made significant contributions to the field of electron beam lithography, showcasing his expertise through his innovative patent.
Latest Patents
Yonatah holds a patent for a "Raster frame beam system for electron beam lithography." This invention presents a method for writing a master image on a substrate by dividing the master image into a matrix of frames. Each frame consists of an array of pixels that define a respective frame image in a specific position within the master image. The process involves scanning an electron beam in a raster pattern over the substrate while shaping the beam responsively to the respective frame image. This allows the electron beam to simultaneously write multiple pixels onto the substrate in each frame.
Career Highlights
Yonatah is currently employed at Applied Materials, Inc., where he continues to develop and refine his innovative ideas. His work has contributed to advancements in the field of lithography, enhancing the capabilities of electron beam technology.
Collaborations
He collaborates with talented coworkers, including Gilad Almogy and Alon Litman, who share his passion for innovation and technology.
Conclusion
Yonatah Lehman's contributions to electron beam lithography exemplify the spirit of innovation in the field. His patent reflects a significant advancement in technology, showcasing his dedication to improving processes in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile