Location History:
- Petach Tikva, IL (2005 - 2007)
- Petah Tikva, IL (2005 - 2012)
Company Filing History:
4 out of 536 
3 out of 13,726 
Years Active: 2005-2012
Title: The Innovative Contributions of Jimmy Vishnipolsky
Introduction
Jimmy Vishnipolsky is a prominent inventor based in Petah Tikva, Israel. He has made significant contributions to the field of technology, particularly in the areas of mask inspection and electron beam lithography. With a total of seven patents to his name, Vishnipolsky's work has had a substantial impact on the industry.
Latest Patents
One of his latest patents is focused on the inspection of EUV masks by a DUV mask inspection tool. This innovative system includes a mask manipulator designed to receive an opaque EUV pod that encloses an EUV mask. The manipulator extracts the EUV mask from the pod in a highly clean environment and covers its upper face with a protective cover that is partially transparent to DUV radiation. Additionally, the system features a scanner that scans the EUV mask using DUV illumination while maintaining a cleanliness level below the tolerable EUV mask cleanliness level. A transport system is also included to move the EUV mask and protective cover between the scanner and the mask manipulator.
Another notable patent is the raster frame beam system for electron beam lithography. This method involves writing a master image on a substrate by dividing the image into a matrix of frames. Each frame contains an array of pixels that define a respective frame image. An electron beam is then scanned in a raster pattern over the substrate, shaping the beam responsively to the respective frame image, allowing for simultaneous writing of multiple pixels onto the substrate.
Career Highlights
Throughout his career, Jimmy Vishnipolsky has worked with leading companies in the technology sector, including Applied Materials Israel Limited and Applied Materials, Inc. His expertise and innovative approach have positioned him as a key player in the development of advanced technologies.
Collaborations
Vishnipolsky has collaborated with notable professionals in the field, including Meir Aloni and Mula Friedman. These collaborations have further enhanced his contributions to the industry and fostered a spirit of innovation.
Conclusion
Jimmy Vishnipolsky's inventive spirit and dedication to advancing technology are evident in his numerous patents and collaborations. His work continues to influence the fields of mask inspection and electron beam lithography, showcasing the importance of innovation in driving progress.