The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2005

Filed:

Nov. 06, 2002
Applicants:

David Aviel, Tel-Mond, IL;

Jimmy Vishnipolsky, Petach Tikva, IL;

Radel Ben-av, Rehovot, IL;

Inventors:

David Aviel, Tel-Mond, IL;

Jimmy Vishnipolsky, Petach Tikva, IL;

Radel Ben-Av, Rehovot, IL;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B037/00 ; G21G005/00 ;
U.S. Cl.
CPC ...
Abstract

A method for scanning a specimenwith beamsof charged particles of a source group. Thereby, a plurality of target pointsis scanned with a charged particle beam emitted by a sourceand the same plurality of target points is scanned with at least one further charged particle beam emitted by at least one further source. Further, the charged particle beams from the source and the at least one further source are emitted on the same target point at different times. Additionally, a multiple charged particle beam source and a data feed system are provided. A source arraycomprises at least one logical emitting unit, wherein patterning information is shifted in a shift circuit, and redundancy emitting units, wherein individual redundancy emitting units obtain patterning information from the shift register.


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