The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
Nov. 19, 2010
Chaim Braude, Nes-Ziona, IL;
Mariano Abramson, Jerusalem, IL;
Adam Baer, Kfar Urivah, IL;
Jimmy Vishnipolsky, Petah Tikva, IL;
Yuri Belenky, Rishon LeZiyyon, IL;
Chaim Braude, Nes-Ziona, IL;
Mariano Abramson, Jerusalem, IL;
Adam Baer, Kfar Urivah, IL;
Jimmy Vishnipolsky, Petah Tikva, IL;
Yuri Belenky, Rishon LeZiyyon, IL;
Applied Materials Israel, Ltd., Rehovot, IL;
Abstract
A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses an EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged to scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and (c) a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.