The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 10, 2007

Filed:

Feb. 23, 2004
Applicants:

Walter D. Mieher, Los Gatos, CA (US);

Ady Levy, Sunnyvale, CA (US);

Boris Golovanesky, Haifa, IL;

Michael Friedmann, Mountain View, CA (US);

Ian Smith, Los Gatos, CA (US);

Michael E. Adel, Zichron Ya'akov, IL;

Mark Ghinovker, Migdal Ha'Emek, IL;

Christopher F. Bevis, Los Gatos, CA (US);

Noam Knoll, Zichron Yaakov, IL;

Moshe Baruch, Misgav, IL;

Inventors:

Walter D. Mieher, Los Gatos, CA (US);

Ady Levy, Sunnyvale, CA (US);

Boris Golovanesky, Haifa, IL;

Michael Friedmann, Mountain View, CA (US);

Ian Smith, Los Gatos, CA (US);

Michael E. Adel, Zichron Ya'akov, IL;

Mark Ghinovker, Migdal Ha'Emek, IL;

Christopher F. Bevis, Los Gatos, CA (US);

Noam Knoll, Zichron Yaakov, IL;

Moshe Baruch, Misgav, IL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. A sample having a plurality of periodic targets that each have a first structure in a first layer and a second structure in a second layer is provided. There are predefined offsets between the first and second structures. Using a scatterometry overlay metrology, scatterometry overlay data is obtained from a first set of the periodic targets based on one or more measured optical signals from the first target set on the sample. Using an imaging overlay metrology, imaging overlay data is obtained from a second set of the periodic targets based on one or more image(s) from the second target set on the sample.


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