Moshe Baruch

Title: The Innovations of Moshe Baruch

Introduction

Moshe Baruch is a notable inventor based in Misgav, Israel. He has made significant contributions to the field of optics and metrology, holding a total of 3 patents. His work focuses on enhancing measurement techniques through innovative optical solutions.

Latest Patents

One of his latest patents is titled "Optics Symmetrization for Metrology." This invention includes an illumination source and at least one illumination symmetrization module (ISM) designed to symmetrize light emanating from the source. It features a first beam splitter that directs light along an object path to the surface of specimens and a second portion along a reference path. A detector is positioned along a primary optical axis to collect light reflected from the specimens.

Another significant patent is "Overlay Metrology by Pupil Phase Analysis." This invention involves measuring phase distributions across a pupil plane of illumination reflected from overlay targets on a semiconductor wafer. It determines phase tilts associated with the overlay targets and calibrates phase tilt data to derive a test overlay value.

Career Highlights

Moshe Baruch has worked with prominent companies in the technology sector, including Kla Tencor Corporation and Kla-Tencor Technologies Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in metrology and optics.

Collaborations

Throughout his career, Moshe has collaborated with talented individuals such as Amnon Manassen and Daniel Kandel. These partnerships have contributed to the advancement of his inventions and the successful implementation of his ideas.

Conclusion

Moshe Baruch's contributions to the field of optics and metrology are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in this area. His work continues to influence the industry and inspire future innovations.