The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Aug. 15, 2011
Amnon Manassen, Haifa, IL;
Daniel Kandel, Aseret, IL;
Moshe Baruch, D.N. Misgav, IL;
Vladimir Levinski, Nazareth Ilit, IL;
Noam Sapiens, Bat Yam, IL;
Joel Seligson, D.N. Misgav, IL;
Andy Hill, Sunnyvale, CA (US);
Ohad Bachar, Timrat, IL;
Daria Negri, Nesher, IL;
Ofer Zaharan, Jerusalem, IL;
Amnon Manassen, Haifa, IL;
Daniel Kandel, Aseret, IL;
Moshe Baruch, D.N. Misgav, IL;
Vladimir Levinski, Nazareth Ilit, IL;
Noam Sapiens, Bat Yam, IL;
Joel Seligson, D.N. Misgav, IL;
Andy Hill, Sunnyvale, CA (US);
Ohad Bachar, Timrat, IL;
Daria Negri, Nesher, IL;
Ofer Zaharan, Jerusalem, IL;
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.