Company Filing History:
Years Active: 2013-2020
Title: Ofer Zaharan: Innovator in Optical Metrology
Introduction
Ofer Zaharan is a prominent inventor based in Jerusalem, Israel. He has made significant contributions to the field of optical metrology, holding a total of 3 patents. His work focuses on enhancing measurement accuracy and minimizing inaccuracy in various applications.
Latest Patents
One of Ofer Zaharan's latest patents is a method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology. This innovative approach involves deriving a partially continuous dependency of metrology metrics on recipe parameters. The analysis of this dependency is conducted through sensitivity landscapes, which help identify regions of low sensitivity and points of low or zero inaccuracy. This method optimizes measurement parameters and enhances the robustness of metrology against inaccuracies.
Another notable patent addresses decreasing inaccuracy due to non-periodic effects on scatterometric signals. This patent provides methods and tools that minimize overlay variation measures at misalignment vector values. By quantifying target noise through multiple repeated overlay measurements, the methods yield optimized scanning patterns and target noise metrics, ultimately improving measurement accuracy.
Career Highlights
Ofer Zaharan has worked with notable companies in the industry, including Kla Tencor Corporation and Kla Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in optical metrology.
Collaborations
Throughout his career, Ofer has collaborated with esteemed colleagues such as Amnon Manassen and Daniel Kandel. These partnerships have contributed to the advancement of his research and the successful implementation of his patented methods.
Conclusion
Ofer Zaharan's contributions to optical metrology through his innovative patents demonstrate his commitment to enhancing measurement accuracy. His work continues to influence the field and inspire future advancements in technology.