Boris Golovanesky is a prominent inventor based in Haifa, Israel. He has made significant contributions to the field of technology, particularly in the area of overlay error detection. With a total of 10 patents to his name, Golovanesky's work has had a substantial impact on the industry.

Latest Patents

Among his latest patents is an innovative apparatus and methods for detecting overlay errors using scatterometry. This invention discloses apparatus and methods for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample. The invention includes targets A, B, C, and D, each designed with different offsets between their first and second structure portions. This allows for precise measurements and error detection in overlay processes. Another notable patent involves a combined scatterometry mark that integrates a scatterometry critical dimension (CD) or profile target with an overlay target, enhancing the measurement capabilities for determining overlay.

Career Highlights

Boris Golovanesky is currently associated with KLA-Tencor Technologies Corporation, a leading company in the field of semiconductor process control and yield management. His work at KLA-Tencor has positioned him as a key player in advancing technologies that improve manufacturing processes.

Collaborations

Throughout his career, Golovanesky has collaborated with notable colleagues, including Walter Dean Mieher and Ady Levy. These collaborations have further enriched his contributions to the field and fostered innovation within his projects.

Conclusion

Boris Golovanesky's innovative work in overlay error detection and scatterometry has established him as a significant figure in technology. His patents reflect a commitment to advancing the industry and improving manufacturing processes.

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