The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2009
Filed:
Oct. 29, 2007
Walter D. Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Boris Golovanesky, Haifa, IL (US);
Michael Friedmann, Mountain View, CA (US);
Ian Smith, Los Gatos, CA (US);
Michael E. Adel, Zichron Ya'akov, IL (US);
Anatoly Fabrikant, Fremont, CA (US);
Walter D. Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Boris Golovanesky, Haifa, IL (US);
Michael Friedmann, Mountain View, CA (US);
Ian Smith, Los Gatos, CA (US);
Michael E. Adel, Zichron Ya'akov, IL (US);
Anatoly Fabrikant, Fremont, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Disclosed is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.