The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2008
Filed:
Feb. 23, 2004
Walter D. Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Boris Golovanesky, Haifa, IL;
Michael Friedmann, Mountain View, CA (US);
Ian Smith, Los Gatos, CA (US);
Michael E. Adel, Zichron Ya'akov, IL;
Christopher F. Bevis, Los Gatos, CA (US);
Paola Dececco, Redwood City, CA (US);
John Fielden, Los Altos, CA (US);
Noah Bareket, Saratoga, CA (US);
Kenneth P. Gross, San Carlos, CA (US);
Mark Ghinovker, Migdal Ha'Emek, IL;
Walter D. Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Boris Golovanesky, Haifa, IL;
Michael Friedmann, Mountain View, CA (US);
Ian Smith, Los Gatos, CA (US);
Michael E. Adel, Zichron Ya'akov, IL;
Christopher F. Bevis, Los Gatos, CA (US);
Paola Dececco, Redwood City, CA (US);
John Fielden, Los Altos, CA (US);
Noah Bareket, Saratoga, CA (US);
Kenneth P. Gross, San Carlos, CA (US);
Mark Ghinovker, Migdal Ha'Emek, IL;
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.