The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Feb. 23, 2004
Walter D. Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Boris Golovanesky, Haifa, IL;
Michael Friedmann, Mountain View, CA (US);
Ian Smith, Los Gatos, CA (US);
Michael E. Adel, Zichron Ya'akov, IL;
Christopher F. Bevis, Los Gatos, CA (US);
John Fielden, Los Altos, CA (US);
Noah Bareket, Saratoga, CA (US);
Anatoly Fabrikant, Fremont, CA (US);
Mark Ghinovker, Migdal Ha'Emek, IL;
Piotr Zalicki, Sunnyvale, CA (US);
Dan Wack, Los Altos, CA (US);
Walter D. Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Boris Golovanesky, Haifa, IL;
Michael Friedmann, Mountain View, CA (US);
Ian Smith, Los Gatos, CA (US);
Michael E. Adel, Zichron Ya'akov, IL;
Christopher F. Bevis, Los Gatos, CA (US);
John Fielden, Los Altos, CA (US);
Noah Bareket, Saratoga, CA (US);
Anatoly Fabrikant, Fremont, CA (US);
Mark Ghinovker, Migdal Ha'Emek, IL;
Piotr Zalicki, Sunnyvale, CA (US);
Dan Wack, Los Altos, CA (US);
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an interferometer is employed to modulate substantially a plurality of wavelengths of a broadband source and then acquiring one or more images of the periodic targets. There are predefined offsets between the first and second structures. An overlay error between the first and second structures is then determined by analyzing the one or more acquired images from the periodic targets using a scatterometry overlay technique based on the predefined offsets.