Company Filing History:
Years Active: 2007
Title: The Innovations of Noam Knoll
Introduction
Noam Knoll is an accomplished inventor based in Zichron Yaakov, Israel. He has made significant contributions to the field of metrology, particularly in the detection of overlay errors in layered samples. His innovative approach has led to the development of a patented technology that enhances the accuracy of measurements in semiconductor manufacturing.
Latest Patents
Noam Knoll holds a patent for an "Apparatus and methods for detecting overlay errors using scatterometry." This patent discloses a method for determining overlay errors between at least two layers in a multiple layer sample. The method involves providing a sample with a plurality of periodic targets, each having a first structure in a first layer and a second structure in a second layer, with predefined offsets between the structures. By utilizing scatterometry overlay metrology, data is obtained from a first set of periodic targets based on measured optical signals. Additionally, imaging overlay metrology is employed to gather data from a second set of periodic targets based on images from the sample.
Career Highlights
Noam Knoll has established himself as a key figure in the field of metrology through his work at Kla-Tencor Technologies Corporation. His expertise in overlay error detection has positioned him as a valuable asset in the semiconductor industry. His innovative solutions have contributed to advancements in manufacturing processes, ensuring higher precision and efficiency.
Collaborations
Throughout his career, Noam has collaborated with notable professionals in the field, including Walter Dean Mieher and Ady Levy. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Noam Knoll's contributions to the field of metrology and his innovative patent demonstrate his commitment to advancing technology in semiconductor manufacturing. His work continues to influence the industry, paving the way for more accurate and efficient measurement techniques.