The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
Dec. 21, 2001
Christian J. Wittak, San Diego, CA (US);
William N. Partlo, Poway, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Paul C. Melcher, El Cajon, CA (US);
David M. Johns, Lakeside, CA (US);
Robert B. Saethre, San Diego, CA (US);
Richard M. Ness, San Diego, CA (US);
Curtis L. Rettig, Vista, CA (US);
Robert A. Shannon, Ramona, CA (US);
Richard C. Ujazdowski, San Diego, CA (US);
Shahryar Rokni, Carlsbad, CA (US);
Scott T. Smith, San Diego, CA (US);
Stuart L. Anderson, San Diego, CA (US);
John M. Algots, San Diego, CA (US);
Ronald L. Spangler, Arlington, MA (US);
Igor V. Fomenkov, San Diego, CA (US);
Thomas D. Steiger, San Diego, CA (US);
Jerome A. Emilo, San Diego, CA (US);
Clay C. Titus, San Diego, CA (US);
Alex P. Ivaschenko, La Jolla, CA (US);
Paolo Zambon, San Diego, CA (US);
Gamaralalage G. Padmabandu, San Diego, CA (US);
Mark S. Branham, Fallbrook, CA (US);
Sunjay Phatak, Alpine, CA (US);
Raymond F. Cybulski, San Diego, CA (US);
Christian J. Wittak, San Diego, CA (US);
William N. Partlo, Poway, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Paul C. Melcher, El Cajon, CA (US);
David M. Johns, Lakeside, CA (US);
Robert B. Saethre, San Diego, CA (US);
Richard M. Ness, San Diego, CA (US);
Curtis L. Rettig, Vista, CA (US);
Robert A. Shannon, Ramona, CA (US);
Richard C. Ujazdowski, San Diego, CA (US);
Shahryar Rokni, Carlsbad, CA (US);
Scott T. Smith, San Diego, CA (US);
Stuart L. Anderson, San Diego, CA (US);
John M. Algots, San Diego, CA (US);
Ronald L. Spangler, Arlington, MA (US);
Igor V. Fomenkov, San Diego, CA (US);
Thomas D. Steiger, San Diego, CA (US);
Jerome A. Emilo, San Diego, CA (US);
Clay C. Titus, San Diego, CA (US);
Alex P. Ivaschenko, La Jolla, CA (US);
Paolo Zambon, San Diego, CA (US);
Gamaralalage G. Padmabandu, San Diego, CA (US);
Mark S. Branham, Fallbrook, CA (US);
Sunjay Phatak, Alpine, CA (US);
Raymond F. Cybulski, San Diego, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.