Arlington, MA, United States of America

Ronald L Spangler



Average Co-Inventor Count = 9.1

ph-index = 7

Forward Citations = 214(Granted Patents)


Company Filing History:


Years Active: 2003-2008

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9 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Ronald L. Spangler

Introduction

Ronald L. Spangler, an accomplished inventor based in Arlington, Massachusetts, holds an impressive portfolio of nine patents. His work primarily focuses on advancements in lithographic processes, particularly through laser spectral engineering. Spangler's innovative techniques play a crucial role in enhancing the efficiency and accuracy of integrated circuit lithography.

Latest Patents

One of Ronald L. Spangler's latest patents is titled "Laser Spectral Engineering for Lithographic Process." This integrated circuit lithography technique involves the application of spectral engineering to control the bandwidth of an electric discharge laser. The methodology employs a computer model to simulate lithographic parameters, allowing for the determination of a desired laser spectrum essential to achieve specific lithographic results.

In this innovative approach, a fast-responding tuning mechanism adjusts the center wavelength of laser pulses within bursts to create an integrated spectrum that aligns with the desired laser spectrum. The laser beam's bandwidth is meticulously controlled to generate an effective beam spectrum characterized by at least two spectral peaks, significantly improving pattern resolution in photo resist films. Furthermore, the invention includes line narrowing equipment with a piezoelectric drive and a rapid bandwidth detection control system, responding in less than 2 milliseconds.

Preferred embodiments of Spangler's work feature a wavelength tuning mirror that operates at rates exceeding 500 dithers per second, synchronized with the repetition rate of the laser. By utilizing varying drive signals, such as square and sine waves, he achieves specific displacement and spectral characteristics. Additional advancements incorporate multiple wavelength tuning positions to produce spectrums with three distinct peaks, showcasing the versatility and depth of his innovations.

Career Highlights

Throughout his esteemed career, Ronald L. Spangler has consistently demonstrated his commitment to innovation in the field of lithography. His impressive contribution through patents not only showcases his technical expertise but also signals his significant impact on the industry. Working with Cymer, Inc., he has played a pivotal role in developing technologies that enhance lithographic processes and improve overall production capabilities.

Collaborations

Spangler's journey in innovation has included collaborations with talented individuals such as John Martin Algots and Igor Vladimirovich Fomenkov. Together, they have advanced the boundaries of laser spectral engineering and its applications in modern lithography. Their combined efforts have led to significant improvements and refinements in the technology used in the semiconductor industry.

Conclusion

In conclusion, Ronald L. Spangler's contributions to the field of lithography through his patents and collaborative efforts mark him as a leading innovator in this domain. His work exemplifies the intersection of technology and creativity, driving advancements that pave the way for future innovations in integrated circuit lithography. Spangler's legacy is one of dedication and ingenuity, inspiring future inventors and engineers to push the limits of technological advancement.

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