Richard L Sandstrom

Title: Richard L Sandstrom: Driving Innovation in Extreme Ultraviolet Light Sources

Introduction:

Richard L Sandstrom, a highly accomplished inventor based in Encinitas, CA, has made significant contributions to the field of extreme ultraviolet (EUV) light sources. With an impressive portfolio of 120 patents, Sandstrom has been instrumental in advancing the technology and capabilities of EUV light sources, which play a critical role in various industries such as semiconductor fabrication and high-resolution lithography.

Latest Patents:

Among Sandstrom's latest patents is the "EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods." This invention comprises a droplet generator, a sensor, a delay circuit, a laser source, and a control system. By accurately timing and triggering laser pulses, this innovative device ensures optimal EUV light generation while preventing energy wastage during non-output periods.

Another noteworthy patent is the "Extreme ultraviolet light source," which presents a novel approach to generating EUV light. By directing an amplified light beam towards a target location, Sandstrom's invention effectively converts target material to plasma, resulting in the emission of EUV light. This patent showcases his ingenuity in leveraging laser technology for EUV light generation.

Career Highlights:

With an extensive background in the industry, Sandstrom has worked with reputable companies such as Cymer, Inc. and Cymer Laser Technologies. These companies, known for their expertise in developing laser technology, have provided Sandstrom with a platform to transform his innovative ideas into practical applications.

Collaborations:

Throughout his career, Sandstrom has collaborated with esteemed colleagues, further amplifying his influence in the field of EUV light sources. Notably, his collaborations with William N Partlo and Igor Vladimirovich Fomenkov have resulted in groundbreaking advancements and enhanced the overall progress of EUV technology.

Conclusion:

Richard L Sandstrom's relentless pursuit of innovation has yielded remarkable contributions to the development of EUV light sources. With an impressive track record of 120 patents, Sandstrom has played a pivotal role in shaping the landscape of EUV technology. His inventions continue to drive advancements in industries that rely on high-resolution lithography and semiconductor fabrication. As he continues his journey, we can undoubtedly expect Sandstrom to make further remarkable strides in the realm of EUV light sources.