The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2016
Filed:
Feb. 28, 2014
Asml Netherlands B.v., Veldhoven, NL;
Yezheng Tao, San Diego, CA (US);
Daniel J. W. Brown, San Diego, CA (US);
Alexander Schafgans, San Diego, CA (US);
Michael David Caudill, San Diego, CA (US);
Daniel J. Golich, San Diego, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Yoshiho Amada, San Diego, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.