Fremont, CA, United States of America

Zefram Marks

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Fremont, CA (US) (2020 - 2022)
  • Gilroy, CA (US) (2020 - 2024)

Company Filing History:


Years Active: 2020-2025

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7 patents (USPTO):

Title: Zefram Marks: Innovator in Optical Metrology

Introduction

Zefram Marks is a notable inventor based in Fremont, California, recognized for his contributions to optical metrology. With a total of seven patents to his name, Marks has made significant advancements in the field, particularly in the integration of optical technologies for photomask inspection.

Latest Patents

One of his latest patents focuses on the integration of an optical height sensor in mask inspection tools. This innovative photomask-inspection system includes a vacuum chamber and a stage that supports a photomask, allowing for horizontal and vertical translation. The system is equipped with an EUV objective to collect EUV light from the photomask, enabling defect inspection. Additionally, the optical height sensor measures heights on the surface of the photomask, while a stage controller translates the stage based on a focal map produced from these measurements. Another significant patent involves optical etendue matching methods for extreme ultraviolet metrology. This optical characterization system comprises a synchrotron source and an optical characterization sub-system, which includes illumination optics and imaging optics. The system is designed to match the etendue of a light beam output by the synchrotron source to the set of illumination optics, enhancing the accuracy of optical characterization.

Career Highlights

Throughout his career, Zefram Marks has worked with prominent companies in the industry, including KLA Corporation and KLA-Tencor Corporation. His work has been instrumental in advancing technologies that are critical for semiconductor manufacturing and optical inspection.

Collaborations

Marks has collaborated with talented individuals in his field, including Gildardo Rios Delgado and Rudy Flores Garcia. These collaborations have contributed to the development of innovative solutions in optical metrology.

Conclusion

Zefram Marks stands out as a key figure in the realm of optical innovations, with a strong portfolio of patents that reflect his expertise and dedication to advancing technology. His contributions continue to influence the industry and pave the way for future advancements in optical metrology.

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