Osaka, Japan

Yuuji Mizuno



Average Co-Inventor Count = 7.2

ph-index = 3

Forward Citations = 42(Granted Patents)


Location History:

  • Kashiwa, JP (1999 - 2000)
  • Osaka, JP (2013 - 2015)

Company Filing History:


Years Active: 1999-2015

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9 patents (USPTO):Explore Patents

Title: Yuuji Mizuno: Innovator in Semiconductor Technology

Introduction

Yuuji Mizuno is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work focuses on advancements in thin film transistors and their applications.

Latest Patents

Mizuno's latest patents include innovative designs for thin film transistor substrates. One notable patent describes a method for producing a substrate where each auxiliary capacitor includes a capacitor line made from the same material as the gate electrode. This design enhances the efficiency of the device by ensuring that the gate insulating film covers the capacitor line effectively. Another significant patent involves a thin film transistor that features an oxide semiconductor thin film formed on a multi-source drain electrode. This design allows for improved contact between the source and drain electrodes, optimizing the performance of the semiconductor device.

Career Highlights

Throughout his career, Yuuji Mizuno has worked with leading companies in the technology sector. He has been associated with Sharp Corporation and the International Superconductivity Technology Center. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Mizuno has collaborated with notable professionals in his field, including Yoshimasa Chikama and Masahiko Suzuki. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Yuuji Mizuno is a key figure in the semiconductor industry, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to influence the development of advanced technologies in this field.

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