Toyama, Japan

Yuta Kanno


 

Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 42(Granted Patents)


Location History:

  • Funabashi, JP (2018 - 2020)
  • Toyama, JP (2013 - 2022)

Company Filing History:


Years Active: 2013-2022

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24 patents (USPTO):Explore Patents

Title: Yuta Kanno: Innovating Semiconductor Manufacturing

Introduction

Yuta Kanno is a prolific inventor based in Toyama, Japan, renowned for his contributions to semiconductor device manufacturing. With an impressive portfolio of 24 patents, Kanno continues to drive innovation in the field, showcasing his expertise in the development of advanced resist underlayer film forming compositions.

Latest Patents

Kanno's latest patents include methods for manufacturing semiconductor devices that utilize silicon-containing resist underlayer film forming compositions. One significant patent details a process for creating a resist underlayer film that is developed with organic solvents post-exposure. This method involves applying a composition that includes hydrolyzable silanes and their hydrolysis products. The specified silanes are mixed in a precise ratio, promoting effective patterning and etching processes in semiconductor manufacturing.

Another notable patent focuses on a resist underlayer film forming composition that incorporates a silane with a cyclic amino group. This composition is designed for lithography applications and functions as a hardmask in resist underlayer film formation. The inclusion of the cyclic amino group in the formulation is meticulously optimized to ensure compatibility and performance in the manufacturing processes.

Career Highlights

Yuta Kanno is currently employed at Nissan Chemical Industries Limited, where he has been instrumental in advancing semiconductor technologies. His work fundamentally supports the production of high-quality semiconductor devices, driving efficiency and effectiveness in lithography processes.

Collaborations

Throughout his career, Kanno has collaborated with notable professionals in the industry, including coworkers Makoto Nakajima and Wataru Shibayama. These partnerships enhance his innovative efforts, bringing together a wealth of knowledge and expertise that propels the development of cutting-edge semiconductor solutions.

Conclusion

Yuta Kanno stands out as a significant inventor within the semiconductor field, with his 24 patents reflecting a deep commitment to innovation. His ongoing work at Nissan Chemical Industries Limited highlights his role in shaping the future of semiconductor manufacturing, promising continued advancements in this vital technological arena.

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