The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
Jan. 08, 2009
Applicants:
Makoto Nakajima, Toyama, JP;
Yuta Kanno, Toyama, JP;
Wataru Shibayama, Toyama, JP;
Inventors:
Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/09 (2006.01); G03F 7/075 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/36 (2006.01); G03F 7/40 (2006.01); C09D 183/08 (2006.01); C08G 77/26 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C09D 183/08 (2013.01); G03F 7/0752 (2013.01); G03F 7/0757 (2013.01); G03F 7/091 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/36 (2013.01); G03F 7/40 (2013.01); C08G 77/26 (2013.01);
Abstract
There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising: a hydrolyzable organosilane having a urea group; a hydrolysis product thereof; or a hydrolysis-condensation product thereof. The hydrolyzable organosilane is for example a compound of Formula (1): where at least one of three groups T, T, and Tis a group of Formula (2):