Tokyo, Japan

Yurina Sekine

USPTO Granted Patents = 26 

 

Average Co-Inventor Count = 2.5

ph-index = 3

Forward Citations = 127(Granted Patents)


Location History:

  • Katsushika-ku, JP (2010 - 2014)
  • Tokyo, JP (2010 - 2018)

Company Filing History:


Years Active: 2010-2018

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26 patents (USPTO):Explore Patents

Introduction

Yurina Sekine is an accomplished inventor based in Tokyo, Japan, with an impressive portfolio of 26 patents. His work primarily focuses on innovative methods for forming and integrating functional materials, showcasing his expertise in material science and engineering.

Latest Patents

Among his latest contributions to the field, Sekine developed a method for forming a functional part in a minute space. This method involves filling a micro cavity with a dispersion functional material, evaporating the liquid medium, and subsequently heating the functional powder to harden it under pressure. Another noteworthy patent is a substrate with built-in passive elements. This substrate integrates various components such as capacitors, inductors, and optical waveguides, enhancing its functionality by incorporating a Si-O bond region derived from a reaction between silicon particles and organic compounds.

Career Highlights

Yurina Sekine has made significant strides in his career at Napra Co., Ltd., where he continues to push the boundaries of innovation in functional materials. His relentless pursuit of improvement in technology has led to numerous patents, solidifying his reputation as a leader in the field.

Collaborations

Sekine is known for his collaborative approach, often working alongside talented colleagues like Shigenobu Sekine and Yoshiharu Kuwana. Together, they contribute to a dynamic team dedicated to advancing material science and developing cutting-edge technologies.

Conclusion

With a focus on innovation and a proven track record of successful patents, Yurina Sekine exemplifies the spirit of invention. His contributions not only enhance the capabilities of functional materials but also pave the way for future advancements in the industry.

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