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For the Inventor, By the Inventor

Hsin-Chu, Taiwan

Yun-Hsiang Wang

USPTO Granted Patents = 14 

Average Co-Inventor Count = 5.3

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:

goldMedal14 out of 40,780 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2021-2025

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14 patents (USPTO):Explore Patents
1. 12419074 - Barrier structure configured to increase performance of III-V devices (2025-09-16),
2. 12363938 - Cap structure coupled to source to reduce saturation current in HEMT device (2025-07-15),
3. 12324211 - Ring transistor structure (2025-06-03),
4. 12278272 - Source leakage current suppression by source surrounding gate structure (2025-04-14),
5. 12100757 - Cap structure coupled to source to reduce saturation current in HEMT device (2024-09-24),
6. 12094838 - Crack stop ring trench to prevent epitaxy crack propagation (2024-09-17),
7. 12046537 - Front-end-of-line (FEOL) through semiconductor-on-substrate via (TSV) (2024-07-23),
8. 11798899 - Crack stop ring trench to prevent epitaxy crack propagation (2023-10-24),
9. 11791388 - Source leakage current suppression by source surrounding gate structure (2023-10-17),
10. 11742419 - Cap structure coupled to source to reduce saturation current in HEMT device (2023-08-29),
11. 11715792 - Barrier structure configured to increase performance of III-V devices (2023-08-01),
12. 11664431 - Ring transistor structure (2023-05-30),
13. 11521915 - Front-end-of-line (FEOL) through semiconductor-on-substrate via (TSV) (2022-12-06),
14. 11195945 - Cap structure coupled to source to reduce saturation current in HEMT device (2021-12-07),

Title: The Innovative Journey of Inventor Yun-Hsiang Wang

Introduction: Yun-Hsiang Wang, a talented inventor hailing from Hsin-Chu, Taiwan, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Wang's latest patents include cutting-edge advancements in semiconductor technology, renewable energy solutions, and artificial intelligence systems, showcasing his versatility and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Wang has worked with leading tech companies and research institutions, spearheading projects that have revolutionized various industries. His expertise in patent applications has led to the successful protection of his inventions.

Collaborations: Wang has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of creativity and excellence. His ability to work in multidisciplinary teams has resulted in the development of pioneering technologies.

Conclusion: In conclusion, Yun-Hsiang Wang's passion for innovation and his dedication to pushing the boundaries of technology have established him as a respected figure in the world of inventors. His relentless pursuit of excellence continues to inspire future generations of innovators.

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