Shijiazhuang, China

Yulong Fang


Average Co-Inventor Count = 8.3

ph-index = 1


Company Filing History:


Years Active: 2020-2022

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5 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Yulong Fang in Semiconductor Technology**

Introduction

Yulong Fang is a prominent inventor based in Shijiazhuang, China, known for his significant contributions in the field of semiconductor technology. With five patents to his name, he has made notable advancements in manufacturing techniques that are pivotal to the development of modern electronic devices.

Latest Patents

Yulong Fang's latest patents showcase his expertise in semiconductor manufacturing processes. His work includes a **Method for Manufacturing Tilted Mesa**, which involves coating a photoresist layer on a chip, heating the chip, and performing etching to create a mesa with a defined tilting angle, followed by the removal of the photoresist layer. Another key patent is the **Method for Preparing Avalanche Photodiode**, a comprehensive procedure that describes the steps to prepare a mesa on a wafer, grow a sacrificial layer, and develop an ohmic contact electrode, among other detailed processes. These inventions highlight the innovative techniques Fang employs to enhance semiconductor device performance.

Career Highlights

Yulong Fang has built an impressive career at esteemed institutions, notably at the **13th Research Institute of China Electronics Technology Group Corporation** and the **13th Research Institute of China Electronics**. His work at these organizations has allowed him to push the boundaries of semiconductor technology and contribute to the industry’s advancement.

Collaborations

Throughout his career, Yulong Fang has collaborated with talented individuals such as Zhihong Feng and Xingye Zhou. These collaborations have been instrumental in the development of his innovative methods and have fostered a culture of creativity and scientific inquiry within his teams.

Conclusion

Yulong Fang's contributions to semiconductor technology through his innovative patents and collaborative efforts have made a significant impact in the field. As technology continues to evolve, his work will likely influence future advancements in semiconductor manufacturing and design. His dedication to innovation serves as an inspiration for both current and future inventors in the industry.

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