The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2022
Filed:
Sep. 24, 2020
The 13th Research Institute of China Electronics Technology Group Corporation, Shijiazhuang, CN;
Xingye Zhou, Shijiazhuang, CN;
Zhihong Feng, Shijiazhuang, CN;
Yuanjie Lv, Shijiazhuang, CN;
Xin Tan, Shijiazhuang, CN;
Xubo Song, Shijiazhuang, CN;
Jia Li, Shijiazhuang, CN;
Yulong Fang, Shijiazhuang, CN;
Yuangang Wang, Shijiazhuang, CN;
Abstract
The disclosure is related to the technical field of semiconductors, and provides a method for manufacturing a tilted mesa and a method for manufacturing a detector. The method for manufacturing a tilted mesa comprises: coating a photoresist layer on a mesa region of a chip; heating the chip on which the photoresist layer is coated from a first preset temperature to a second preset temperature; performing etching processing on the heated chip, so as to manufacture a mesa having a preset tilting angle; and removing the photoresist layer on the mesa region of the chip after the mesa is manufactured.