Vancouver, WA, United States of America

Yukihiko Nakata

This inventor holds 28 USPTO granted patents, primarily in Thin Film Transistors. Top assignees: Sharp Laboratories of America, Inc, Sharp Kabushiki Kaisha Corporation, Advanced Lcd Technologies Development Center Co., Ltd.. Active years: 1991-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yukihiko Nakata. Retrieved from https://idiyas.com/inventor/yukihiko-nakata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 53.6

Average Co-Inventor Count = 2.5

ph-index = 14

Forward Citations = 1,174(Granted Patents)


Location History:

  • Vancouver, WA (US) (2001 - 2004)
  • Nara, JP (1991 - 2007)
  • Yokohama, JP (2007 - 2012)

Company Filing History:


Years Active: 1991-2012

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Areas of Expertise:
Plasma Treatment
Thin-Film Formation
Semiconductor Device
Sputtered Silicon
Metal-Induced Crystallization
Liquid Crystal Display
Amorphous Solar Cell
Tandem Stacked Device
High Field-Effect Mobility
Channel Characteristics
Dielectric Plates
Porous Metal Layer
28 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Yukihiko Nakata in Plasma Technology**

Introduction

Yukihiko Nakata, based in Vancouver, WA, is a prolific inventor with a remarkable portfolio of 28 patents. His work primarily focuses on advancements in plasma technology, which finds applications in various fields, including materials processing and surface treatment. Nakata has made significant contributions with his innovative approaches to plasma treatment apparatus and methods.

Latest Patents

Nakata's latest patents include groundbreaking inventions such as the **Plasma Treatment Apparatus and Plasma Treatment Method**. This apparatus generates plasma in a treatment vessel through an electromagnetic wave that is radiated from an electromagnetic wave radiation portion, facilitating effective plasma treatment. Notably, at least part of the vessel's wall serves as an electromagnetic wave transmission path, enhancing the efficiency of the process.

Another significant invention is the **Plasma Processing Apparatus with Dielectric Plates and Fixing Member Wavelength Dependent Spacing**. In this apparatus, electromagnetic waves are directed through dielectric windows into a processing chamber, generating plasma to treat a substrate. The design features dielectric plates attached to beams opposite the processing chamber, optimizing the thickness of these plates for uniform large-area processing, ensuring consistent results.

Career Highlights

Yukihiko Nakata has held esteemed positions in notable companies, including Sharp Laboratories of America, Inc. and Sharp Kabushiki Kaisha Corporation. His tenure at these organizations has allowed him to utilize his expertise in plasma technology, contributing to significant advancements in the field.

Collaborations

Throughout his career, Nakata has collaborated with esteemed colleagues such as Apostolos T. Voutsas and Kazufumi Azuma. These partnerships have been instrumental in driving innovation and enhancing the development of plasma treatment technologies.

Conclusion

Yukihiko Nakata stands out as a key innovator in plasma technology, with his extensive patent portfolio underscoring his commitment to advancing the field. His innovative contributions not only demonstrate his expertise but also pave the way for future developments in plasma applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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