The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2012
Filed:
Mar. 17, 2005
Applicants:
Hideo Sugai, Nagoya, JP;
Tetsuya Ide, Yokohama, JP;
Atsushi Sasaki, Yokohama, JP;
Kazufumi Azuma, Yokohama, JP;
Yukihiko Nakata, Yokohama, JP;
Inventors:
Hideo Sugai, Nagoya, JP;
Tetsuya Ide, Yokohama, JP;
Atsushi Sasaki, Yokohama, JP;
Kazufumi Azuma, Yokohama, JP;
Yukihiko Nakata, Yokohama, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/511 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A plasma treatment apparatus generates a plasma in a treatment vessel by an electromagnetic wave radiated from an electromagnetic wave radiation portion into the treatment vessel to perform plasma treatment by the plasma. At least a part of a wall constituting the treatment vessel includes at least a part of an electromagnetic wave transmission path which transmits the electromagnetic wave.