The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2007
Filed:
Oct. 08, 2003
Masashi Goto, Yokohama, JP;
Yukihiko Nakata, Nara, JP;
Kazufumi Azuma, Yokohama, JP;
Tetsuya Okamoto, Kamakura, JP;
Masashi Goto, Yokohama, JP;
Yukihiko Nakata, Nara, JP;
Kazufumi Azuma, Yokohama, JP;
Tetsuya Okamoto, Kamakura, JP;
Abstract
A plasma processing apparatus comprises: a chamberhaving at least one opening and for generating plasma; a dielectric memberprovided to cover the opening air-tightly; at least one wave guideprovided in the exterior of the chamber such that the one end side opposes the dielectric member; an electromagnetic wave sourceprovided on the other end side of the wave guide; a plurality of holesprovided on a surface opposing the dielectric member of the wave guide; and hole area adjusting meansprovided in at least one of the above-mentioned holes so as to adjust the opening area of the hole.