The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Oct. 27, 2005
Tetsuya Ide, Yokohama, JP;
Atsushi Sasaki, Yokohama, JP;
Kazufumi Azuma, Yokohama, JP;
Yukihiko Nakata, Yokohama, JP;
Tetsuya Ide, Yokohama, JP;
Atsushi Sasaki, Yokohama, JP;
Kazufumi Azuma, Yokohama, JP;
Yukihiko Nakata, Yokohama, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
In a plasma processing apparatus, electromagnetic waves are radiated from slots of waveguides into a processing chamber via dielectric windows that are supported on beams, thereby generating a plasma. A substrate, which is an object of processing, is processed by the generated plasma. Dielectric plates are attached to those surfaces of the beams, which are opposed to the processing chamber. The thickness of each dielectric plate is set at ½ or more of the intra-dielectric wavelength of the electromagnetic waves. Using the plasma processing apparatus, a large-area processing can uniformly be performed.