Tainan, Taiwan

Yu-Shih Wang

This inventor holds 16 USPTO granted patents and 3 published patent applications, primarily in Semiconductor Manufacturing. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2021-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yu-Shih Wang. Retrieved from https://idiyas.com/inventor/yu-shih-wang-wi6xzp34

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 81.3

Average Co-Inventor Count = 5.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2026

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Areas of Expertise:
Semiconductor Device
Manufacturing Method
Contact Plug
Hourglass-Shaped Opening
Work Function Layer
Conductive Feature
Bottom-Up Filling
Etch Stop Layer
Metal Gate
Multilayer Dielectric
Connecting Structure
16 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Yu-Shih Wang

Introduction

Yu-Shih Wang is a prominent inventor based in Tainan, Taiwan, known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of 11 patents, he has played a pivotal role in the advancement of innovative methods within this critical industry.

Latest Patents

Among his latest patents are groundbreaking inventions that enhance semiconductor device manufacturing processes. One notable patent is the "Method of Breaking Through Etch Stop Layer," which details a technique using a photo resist layer to protect both a dielectric layer and the conductive elements embedded within it when patterning an etch stop layer beneath the dielectric. This innovative method not only safeguards the conductive elements from damage caused by wet etchants but also improves the etching process for subsequent dielectric layers, ultimately aiding in exposing essential contacts. Another significant patent is related to the "Conductive Feature of a Semiconductor Device," which outlines a method for forming a semiconductor device. This technique involves creating a conductive region over a substrate and employing a dielectric layer while ensuring proper exposure for contact openings that facilitate efficient integration of conductive materials.

Career Highlights

Yu-Shih Wang is currently associated with Taiwan Semiconductor Manufacturing Company Limited, a world leader in semiconductor manufacturing services. His experience and expertise have been crucial in driving forward the company's innovative strategies and technological advancements in the semiconductor sector.

Collaborations

Throughout his career, Yu-Shih Wang has collaborated with notable professionals in the field, including Ming-Hsi Yeh and Chun-Neng Lin. These collaborations reflect a rich synergy of ideas and innovations that contribute to the ongoing development of cutting-edge semiconductor technologies.

Conclusion

In summary, Yu-Shih Wang stands out as a significant figure in the semiconductor industry, owing to his impressive list of patents and collaborative spirit. His inventive approaches not only enhance the manufacturing of semiconductor devices but also lay the foundation for future innovations in technology. As he continues his work, Yu-Shih Wang remains an inspirational inventor paving the way for advancements in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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