Hsinchu, Taiwan

Yu-Cheng Shiau

USPTO Granted Patents = 6 

Average Co-Inventor Count = 2.8

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018-2025

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6 patents (USPTO):Explore Patents

Title: Innovations of Yu-Cheng Shiau in Semiconductor Technology

Introduction

Yu-Cheng Shiau is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on improving the manufacturing processes and features of semiconductor devices.

Latest Patents

Among his latest patents, Yu-Cheng Shiau has developed methods for forming improved isolation features in semiconductor devices. One of his notable inventions involves etching a first trench in a substrate and depositing insulation layers using flowable chemical vapor deposition processes. This method allows for the formation of insulating fins in unfilled portions of the trench, enhancing the performance of semiconductor devices. Another patent details a semiconductor device and its manufacturing method, which includes the deposition and annealing of liners to transform materials, thereby improving the efficiency and functionality of semiconductor fins.

Career Highlights

Yu-Cheng Shiau has worked with leading organizations in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Limited and Tsinghua University. His experience in these institutions has allowed him to collaborate on cutting-edge research and development projects, further advancing the field of semiconductor technology.

Collaborations

Throughout his career, Yu-Cheng Shiau has collaborated with notable colleagues such as Wan-Yi Kao and Chih-Tang Peng. These partnerships have contributed to the successful development of innovative semiconductor solutions.

Conclusion

Yu-Cheng Shiau's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes and device performance.

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