IDiyas

For the Inventor, By the Inventor

Joetsu, Japan

Yoshitaka Hamada

USPTO Granted Patents = 37

 

Average Co-Inventor Count = 3.3

ph-index = 9

Forward Citations = 250(Granted Patents)


Location History:

  • Annaka, JP (1991 - 1996)
  • Usui-gun, JP (1999 - 2000)
  • Gunma-ken, JP (2002 - 2004)
  • Nakakubiki-gun, JP (2006)
  • Niigata-ken, JP (2005 - 2010)
  • Joetsu, JP (2007 - 2015)

Company Filing History:

goldMedal32 out of 5,966 
 
Shin-etsu Chemical Co., Ltd.
 patents
silverMedal10 out of 27,375 
 
Matsushita Electric Industrial Co., Ltd.
 patents
bronzeMedal2 out of 16,453 
 
Panasonic Corporation
 patents
4. 2 out of 164,108 
 
International Business Machines Corporation
 patents
5. 1 out of 1,257 
 
Hitachi-kokusai Electric Inc.
 patents
6. 1 out of 31 
 
Matsushita Electric Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1991-2015

where 'Filed Patents' based on already Granted Patents

37 patents (USPTO):
1. 9018095 - Formation of conductive circuit, conductive circuit, and conductive ink composition (2015-04-28),
2. 8604126 - Silicone resin composition and optical material (2013-12-10),
3. 8546597 - Organic silane compound for forming Si-containing film by plasma CVD and method for forming Si-containing film (2013-10-01),
4. 8461367 - Preparation process of trisilylamine (2013-06-11),
5. 8277600 - High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device (2012-10-02),
6. 8257528 - Substrate joining method and 3-D semiconductor device (2012-09-04),
7. 8153836 - Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing (2012-04-10),
8. 7981815 - Semiconductor device producing method and substrate processing apparatus (2011-07-19),
9. 7923522 - Process for preparing a dispersion liquid of zeolite fine particles (2011-04-12),
10. 7786022 - Method for forming insulating film with low dielectric constant (2010-08-31),
11. 7754330 - Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device (2010-07-13),
12. 7745094 - Resist composition and patterning process using the same (2010-06-29),
13. 7651829 - Positive resist material and pattern formation method using the same (2010-01-26),
14. 7638256 - Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process (2009-12-29),
15. 7550247 - Resist composition and patterning process (2009-06-23),

Title: The Innovative Journey of Inventor Yoshitaka Hamada

Introduction: Yoshitaka Hamada, a visionary inventor hailing from Joetsu, Japan, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Yoshitaka Hamada's recent patents include cutting-edge advancements in robotics, artificial intelligence, and renewable energy technologies, showcasing his commitment to driving innovation in various sectors.

Career Highlights: With a career spanning over two decades, Yoshitaka Hamada has established himself as a leading figure in the world of inventors. His work has not only revolutionized industries but has also inspired a new generation of innovators to push the boundaries of what is possible.

Collaborations: Throughout his career, Yoshitaka Hamada has collaborated with top research institutions, universities, and tech companies to bring his inventions to life. His ability to work seamlessly in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: In conclusion, Yoshitaka Hamada's relentless pursuit of innovation and his passion for creating a better future through technology make him a true pioneer in the world of inventors. His work continues to impact industries and pave the way for a more technologically advanced world.

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