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For the Inventor, By the Inventor

Joetsu, Japan

Yoshitaka Hamada

This inventor holds 37 USPTO granted patents and 7 EPO patents, primarily in Semiconductor Materials. Top assignees: Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd., International Business Machines Corporation. Active years: 1991-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshitaka Hamada. Retrieved from https://idiyas.com/inventor/yoshitaka-hamada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 37

% Patents Active = 59.5

 

Average Co-Inventor Count = 3.3

ph-index = 9

Forward Citations = 253(Granted Patents)


Location History:

  • Annaka, JP (1991 - 1996)
  • Usui-gun, JP (1999 - 2000)
  • Gunma-ken, JP (2002 - 2004)
  • Nakakubiki-gun, JP (2006)
  • Niigata-ken, JP (2005 - 2010)
  • Joetsu, JP (2007 - 2015)

Company Filing History:

goldMedal32 out of 5,989 
 
Shin-Etsu Chemical Co., Ltd.
 patents
silverMedal10 out of 27,375 
 
Matsushita Electric Industrial Co., Ltd.
 patents
bronzeMedal2 out of 166,325 
 
International Business Machines Corporation
 patents
4. 2 out of 16,454 
 
Panasonic Corporation
 patents
5. 1 out of 1,258 
 
Hitachi-Kokusai Electric Inc.
 patents
6. 1 out of 31 
 
Matsushita Electric Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1991-2015

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Areas of Expertise:
Conductive Circuit
Resist Composition
Porous Film
Silicone Resin
Organic Silane
3D Semiconductor
Silsesquioxane
Bonding Composition
Dispersion Liquid
Insulating Film
Conductive Powder
Polysilane Copolymers
37 patents (USPTO):Explore Patents
1. 9018095 - Formation of conductive circuit, conductive circuit, and conductive ink composition (2015-04-28),
2. 8604126 - Silicone resin composition and optical material (2013-12-10),
3. 8546597 - Organic silane compound for forming Si-containing film by plasma CVD and method for forming Si-containing film (2013-10-01),
4. 8461367 - Preparation process of trisilylamine (2013-06-11),
5. 8277600 - High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device (2012-10-02),
6. 8257528 - Substrate joining method and 3-D semiconductor device (2012-09-04),
7. 8153836 - Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing (2012-04-10),
8. 7981815 - Semiconductor device producing method and substrate processing apparatus (2011-07-19),
9. 7923522 - Process for preparing a dispersion liquid of zeolite fine particles (2011-04-12),
10. 7786022 - Method for forming insulating film with low dielectric constant (2010-08-31),
11. 7754330 - Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device (2010-07-13),
12. 7745094 - Resist composition and patterning process using the same (2010-06-29),
13. 7651829 - Positive resist material and pattern formation method using the same (2010-01-26),
14. 7638256 - Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process (2009-12-29),
15. 7550247 - Resist composition and patterning process (2009-06-23),

Title: The Innovative Journey of Inventor Yoshitaka Hamada

Introduction: Yoshitaka Hamada, a visionary inventor hailing from Joetsu, Japan, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Yoshitaka Hamada's recent patents include cutting-edge advancements in robotics, artificial intelligence, and renewable energy technologies, showcasing his commitment to driving innovation in various sectors.

Career Highlights: With a career spanning over two decades, Yoshitaka Hamada has established himself as a leading figure in the world of inventors. His work has not only revolutionized industries but has also inspired a new generation of innovators to push the boundaries of what is possible.

Collaborations: Throughout his career, Yoshitaka Hamada has collaborated with top research institutions, universities, and tech companies to bring his inventions to life. His ability to work seamlessly in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: In conclusion, Yoshitaka Hamada's relentless pursuit of innovation and his passion for creating a better future through technology make him a true pioneer in the world of inventors. His work continues to impact industries and pave the way for a more technologically advanced world.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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