The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2009
Filed:
Jul. 06, 2006
Applicants:
Takeshi Kinsho, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Mutsuo Nakashima, Joetsu, JP;
Yoshitaka Hamada, Joetsu, JP;
Inventors:
Takeshi Kinsho, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Mutsuo Nakashima, Joetsu, JP;
Yoshitaka Hamada, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
Abstract
Silicon compounds having fluorinated hemiacetal structure are provided. Silicone resins having the same structure have an appropriate acidity to enable formation of a finer pattern by minimizing the pattern collapse by swelling, exhibit improved resistance to the etching used in the pattern transfer to an organic film, and are thus suited for use in resist compositions for the bilayer process.