Company Filing History:
Years Active: 2016-2022
Title: The Innovations of Yoichiro Ichioka
Introduction
Yoichiro Ichioka is a prominent inventor based in Annaka, Japan. He has made significant contributions to the field of photosensitive resin compositions, holding a total of 12 patents. His work has advanced the technology used in various applications, particularly in the electronics industry.
Latest Patents
Ichioka's latest patents include a photosensitive resin composition and photosensitive dry film. This innovative composition comprises 100 parts by weight (pbw) of a phenolic hydroxyl group-containing resin and 0.1-18 pbw of an epoxy additive. The epoxy additive is a compound containing 1-8 epoxy groups per molecule, which includes nitrogen, sulfur, or phosphorus, and has a molecular weight ranging from 50 to 6,000. This composition demonstrates an improved bonding force to metal wirings. Another notable patent involves a photosensitive resin composition, photosensitive resin laminate, and pattern forming process. This composition includes 100 pbw of a polyimide silicone containing a primary alcoholic hydroxyl group, along with a crosslinker, a photoacid generator, a polyfunctional epoxy compound, and a filler with an average particle size of 0.01-20.0 micrometers. The resulting resin composition is both colored and photosensitive, curing into a product with enhanced modulus.
Career Highlights
Throughout his career, Ichioka has worked with notable companies, including Shin-Etsu Chemical Co., Ltd. His experience in these organizations has allowed him to refine his expertise in the development of advanced materials.
Collaborations
Ichioka has collaborated with esteemed colleagues such as Kazunori Kondo and Hideto Kato. Their combined efforts have contributed to the advancement of technology in their field.
Conclusion
Yoichiro Ichioka's innovative work in photosensitive resin compositions has made a significant impact on the industry. His patents reflect a commitment to enhancing technology and improving product performance.