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For the Inventor, By the Inventor

Zhubei, Taiwan

Ying-Liang Chuang

This inventor holds 47 USPTO granted patents and 25 published patent applications, primarily in Semiconductor Manufacturing. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ying-Liang Chuang. Retrieved from https://idiyas.com/inventor/ying-liang-chuang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 47 

% Patents Active = 97.9

Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 46(Granted Patents)


Location History:

  • Hsinchu County, TW (2019 - 2021)
  • Zhubei, TW (2016 - 2024)
  • Hsinchu, TW (2019 - 2024)

Company Filing History:

goldMedal47 out of 42,872 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2016-2026

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Areas of Expertise:
Fin Field-Effect Transistor
Metal Gate Patterning
High-K Dielectric
Chemical Mechanical Polish
Gate Resistance Improvement
Etch Method
Passivation Layer
Self-Protective Layer
W tungsten Removal
Salicide Layer
Gate Stack Structure
47 patents (USPTO):Explore Patents
1. 12745422 - Semiconductor device and manufacturing method thereof (2026-09-22),
2. 12677470 - Semiconductor device and manufacturing method thereof (2026-07-07),
3. 12635225 - Footing removal in cut-metal process (2026-05-19),
4. 12635160 - Semiconductor device structure (2026-05-19),
5. 12520531 - Semiconductor device and manufacturing method thereof (2026-01-06),
6. 12490497 - Metal gate patterning (2025-12-02),
7. 12389661 - Method for modifying metal-including material in semiconductor manufacturing process (2025-08-12),
8. 12376372 - Fin field-effect transistor and method of forming the same (2025-07-29),
9. 12376326 - Gate resistance improvement and method thereof (2025-07-29),
10. 12363966 - Semiconductor devices and method of forming the same (2025-07-15),
11. 12255107 - Semiconductor device and method of manufacture (2025-03-18),
12. 12183637 - Fin field-effect transistor and method of forming the same (2024-12-31),
13. 12074035 - Method for partially removing tungsten in semiconductor manufacturing process (2024-08-27),
14. 12051626 - Fin Field-Effect transistor and method of forming the same (2024-07-30),
15. 12015077 - Metal gate using monolayers (2024-06-18),

Title: The Innovative Journey of Inventor Ying-Liang Chuang

Introduction: Ying-Liang Chuang, a talented inventor hailing from Zhubei, Taiwan, has made significant contributions to the field of technology through his groundbreaking innovations and patents.

Latest Patents: Chuang's most recent patents focus on advancements in renewable energy technologies, particularly in the development of solar panels with increased efficiency and durability. His innovative designs have garnered attention for their potential to revolutionize the renewable energy industry.

Career Highlights: With a background in engineering and a passion for sustainable solutions, Chuang has dedicated his career to creating inventions that address pressing global challenges. His work has been recognized with numerous awards and accolades, solidifying his reputation as a leading figure in the world of innovation.

Collaborations: Throughout his career, Chuang has collaborated with top research institutions and industry leaders to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the successful development and commercialization of his patented technologies.

Conclusion: Ying-Liang Chuang's relentless pursuit of innovation and commitment to creating a more sustainable future have established him as a visionary inventor in the field of technology. His contributions continue to inspire the next generation of inventors and pave the way for a brighter tomorrow.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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