Company Filing History:
Years Active: 2007-2010
Title: Yi-Yiing Chiang: Innovator in Semiconductor Technology
Introduction
Yi-Yiing Chiang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on innovative semiconductor devices and fabrication methods that enhance the performance and reliability of electronic components.
Latest Patents
Among his latest patents, Yi-Yiing has developed a semiconductor device that includes at least one conductive structure. This device features a silicon-containing conductive layer, a refractory metal salicide layer, and a protection layer. The refractory metal salicide layer is strategically placed over the silicon-containing conductive layer, while the protection layer is positioned above the salicide layer. Additionally, he has created another semiconductor device that incorporates a refractory metal alloy salicide layer, formed through a reaction between the silicon of the conductive layer and a refractory metal alloy layer. This innovative design also includes a protection layer over the alloy salicide layer.
Furthermore, Yi-Yiing has patented a method for forming a metal oxide semiconductor (MOS) transistor. This method involves the formation of a gate structure over a substrate, followed by the creation of offset spacers on the gate's sidewalls. A first ion implantation process is executed to establish a lightly doped drain (LDD) in the substrate adjacent to the gate structure. Subsequent processes include the formation of additional spacers, a second ion implantation for the source/drain region, and the creation of a metal silicide layer on the source and drain surfaces. An oxide layer is then formed to protect the metal silicide layer during the removal of the spacers.
Career Highlights
Yi-Yiing Chiang is currently employed at United Microelectronics Corporation, where he continues to push the boundaries of semiconductor technology. His expertise and innovative approach have positioned him as a key player in the industry.
Collaborations
Throughout his career, Yi-Yiing has collaborated with talented individuals such as Yu-Lan Chang and Chao-Ching Hsieh. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Yi-Yiing Chiang's contributions to semiconductor technology are noteworthy and impactful. His innovative patents and methods are paving the way for advancements in electronic devices. His work exemplifies the spirit of innovation that drives the technology sector forward.