Hsinchu, Taiwan

Yi-Ting Wang

This inventor holds 21 USPTO granted patents and 1 published patent application and 3 EPO patents, primarily in Semiconductor Technology. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Industrial Technology Research Institute, King Yuan Electronics Co, Ltd.. Active years: 2007-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yi-Ting Wang. Retrieved from https://idiyas.com/inventor/yi-ting-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 85.7

 

Average Co-Inventor Count = 4.8

ph-index = 4

Forward Citations = 54(Granted Patents)


Location History:

  • Taichung, TW (2018)
  • Hsinchu County, TW (2015 - 2019)
  • Hsinchu, TW (2007 - 2022)
  • Zhubei, TW (2016 - 2022)
  • Kaohsiung, TW (2020 - 2023)

Company Filing History:


Years Active: 2007-2026

Loading Chart...
Loading Chart...
Areas of Expertise:
Image Sensor Structure
Metal Gate Structure
Capping Layers
In-Situ Etching
Burn-In Test Module
Signal Processing
Ultrasound Imaging
Semiconductor Device
Beamforming Method
TCP Packet Transmission
WLAN Communication
Circuit Simulation
21 patents (USPTO):Explore Patents

Title: **Innovator Spotlight: Yi-Ting Wang**

Introduction

Yi-Ting Wang is a prominent inventor based in Hsinchu County, Taiwan, known for her significant contributions to the field of semiconductor technology. With an impressive portfolio of 18 patents, she has established herself as a key figure in advancing manufacturing methods for semiconductor structures.

Latest Patents

Yi-Ting Wang's recent patent, "Formation and In-Situ Etching Processes for Metal Layers," reflects her innovative approach to semiconductor device fabrication. This patent details a sophisticated method that involves forming an opening in a substrate, followed by the deposition of a conformal metal layer. The meticulous process includes multiple deposition cycles, wherein a first precursor is flowed into a deposition chamber and then purged to eliminate excess material. A second precursor is subsequently introduced to create a sublayer of the conformal metal, along with further purging. The procedure culminates with a metallic halide etching (MHE) process that incorporates a third precursor, showcasing her expertise in enhancing semiconductor manufacturing.

Career Highlights

Yi-Ting has made substantial strides in her career by working with esteemed organizations such as Taiwan Semiconductor Manufacturing Company Ltd. and the Industrial Technology Research Institute. Her experience in these top-tier companies has provided her with a platform to innovate and develop groundbreaking technologies in the semiconductor industry.

Collaborations

Throughout her career, Yi-Ting Wang has collaborated with distinguished colleagues, including Hsien-Ming Lee and Tsung-Ta Tang. These partnerships have enabled the exchange of ideas and knowledge, fostering a collaborative environment essential for driving innovation in her field.

Conclusion

Yi-Ting Wang stands out as a trailblazer in semiconductor innovation, with her 18 patents illustrating her commitment to technological advancement. As she continues to push the boundaries of semiconductor fabrication methods, her contributions are set to have a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…