Company Filing History:

10 out of 40,635

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

4 out of 9,138

Industrial Technology Research Institute

patents

Years Active: 2009-2025

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14 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12292686 - Semiconductor structure and manufacturing method thereof (2025-05-06),

2. 11226562 - Semiconductor structure and manufacturing method thereof (2022-01-18),

3. 10061211 - Method for layoutless overlay control (2018-08-28),

4. 9772561 - Semiconductor manufacturing method and tool (2017-09-26),

5. 9766559 - Edge-dominant alignment method in exposure scanner system (2017-09-19),

6. 9646902 - Paired edge alignment (2017-05-09),

7. 9646896 - Lithographic overlay sampling (2017-05-09),

8. 9442392 - Scanner overlay correction system and method (2016-09-13),

9. 9164398 - Overlay metrology method (2015-10-20),

10. 9123583 - Overlay abnormality gating by Z data (2015-09-01),

11. 8947620 - Broadband cholesteric liquid crystal film, method for fabricating the same, polarization device, and high light efficiency liquid crystal display employing the same (2015-02-03),

12. 8922740 - Light efficiency enhancing optical devices (2014-12-30),

13. 8023080 - High transmittance brightness enhanced optical element for LCD by wholly coating process (2011-09-20),

14. 7619712 - Polarizer-alignment dual function film, fabrication method thereof and LCD containing the same (2009-11-17),

Title: Yi-Ping Hsieh: Innovator in Semiconductor Technology

Introduction

Yi-Ping Hsieh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work has been instrumental in advancing manufacturing methods and structures within the semiconductor industry.

Latest Patents

One of Yi-Ping Hsieh's latest patents focuses on a semiconductor structure and its manufacturing method. This innovative method involves providing a mask that includes a first substrate and a first mask layer with multiple recesses. A second mask layer is then placed over the first mask layer, also containing several recesses. The process includes providing a second substrate with a photoresist and projecting predetermined electromagnetic radiation through the mask towards the photoresist. The first mask layer is designed to be at least partially transparent to the radiation, while the second mask layer is opaque, ensuring precise manufacturing of semiconductor structures.

Career Highlights

Yi-Ping Hsieh has worked with notable companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and the Industrial Technology Research Institute. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Throughout his career, Yi-Ping Hsieh has collaborated with esteemed colleagues such as Yung-Yao Lee and Hui-Lung Kuo. These partnerships have contributed to the advancement of semiconductor technologies and have fostered a collaborative environment for innovation.

Conclusion

Yi-Ping Hsieh's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and pave the way for future advancements.

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