The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Jan. 24, 2017
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Yung-Yao Lee, Zhubei, TW;
Yi-Ping Hsieh, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A method for layoutless overlay control is provided. In some embodiments, a target layer covering a workpiece is patterned using a reticle. The patterning forms a plurality of exposure fields arranged according to a first exposure field layout. Alignment of the exposure fields relative to the workpiece is measured to generate displacement vectors. An inter-field model and an intra-field model are trained using the displacement vectors and a reference field layout. The intra-field model is transformed for use with a second exposure field layout, where the second exposure field layout is different than the first exposure field layout. Overlay corrections are generated based on the trained inter-field model and the transformed intra-field model.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile